Stacked type semiconductor memory device and method for manufacturing the same

ABSTRACT

According to one embodiment, a semiconductor memory device includes a substrate, semiconductor pillars, first electrode films, a second electrode film, a first insulating film, a second insulating film, and a contact. The semiconductor pillars are provided on the substrate, extend in a first direction crossing an upper surface of the substrate, and are arranged along second and third directions being parallel to the upper surface and crossing each other. The first electrode films extend in the third direction. The second electrode film is provided between the semiconductor pillars and the first electrode films. The first insulating film is provided between the semiconductor pillars and the second electrode film. The second insulating film is provided between the second electrode film and the first electrode films. The contact is provided at a position on the third direction of the semiconductor pillars and is connected to the first electrode films.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is based upon and claims the benefit of priority fromU.S. Provisional Patent Application 62/097,982, filed on Dec. 30, 2014;the entire contents of which are incorporated herein by reference.

FIELD

Embodiments described herein relate generally to a semiconductor memorydevice and a method for manufacturing the same.

BACKGROUND

The bit cost of NAND flash memories has been reduced by miniaturizationof the planar structure and use of multivalued memory cells. However,the miniaturization of the planar structure is approaching the limit dueto the limitations of processing technologies and the cost increase oflithography devices. Thus, technologies for vertically stacking memorycells have been proposed in recent years.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a perspective view showing a semiconductor memory deviceaccording to a first embodiment;

FIG. 2 is a sectional view showing the semiconductor memory deviceaccording to the first embodiment;

FIG. 3 is a sectional view showing region A shown in FIG. 2;

FIG. 4 is a sectional view taken along line B-B′ shown in FIG. 2,

FIG. 5 is a sectional view showing a method for manufacturing asemiconductor memory device according to the first embodiment;

FIG. 6 is a plan view showing the method for manufacturing asemiconductor memory device according to the first embodiment;

FIG. 7 is a sectional view showing the method for manufacturing asemiconductor memory device according to the first embodiment;

FIG. 8 is a plan view showing the method for manufacturing asemiconductor memory device according to the first embodiment;

FIG. 9 to FIG. 11 are sectional views showing the method formanufacturing a semiconductor memory device according to the firstembodiment;

FIG. 12 is a plan view showing the method for manufacturing asemiconductor memory device according to the first embodiment;

FIG. 13 to FIG. 20 are sectional views showing the method formanufacturing a semiconductor memory device according to the firstembodiment;

FIG. 21 to FIG. 25 are plan views showing the method for manufacturing asemiconductor memory device according to the first embodiment;

FIG. 26A is a plan view showing the relationship between the controlgate electrode film and the slit in the first embodiment, FIG. 26B is aplan view showing the relationship between an upper select gate 21 u andthe slit;

FIG. 27 to FIG. 31 are plan views showing a method for manufacturing asemiconductor memory device according to a second embodiment;

FIG. 32 is a plan view showing a method for manufacturing asemiconductor memory device according to a variation of the secondembodiment;

FIG. 33 to FIG. 37 are plan views showing a method for manufacturing asemiconductor memory device according to a third embodiment;

FIG. 38 to FIG. 41 are plan views showing a method for manufacturing asemiconductor memory device according to a fourth embodiment;

FIG. 42 is a plan view showing a method for manufacturing asemiconductor memory device according to a fifth embodiment;

FIG. 43 to FIG. 47 are plan views showing a method for manufacturing asemiconductor memory device according to a sixth embodiment;

FIG. 48A is a plan view showing a semiconductor memory device accordingto the sixth embodiment, FIG. 48B is a sectional view taken along lineC-C′ shown in FIG. 48A;

FIG. 49A is a plan view showing the semiconductor memory deviceaccording to the sixth embodiment, FIG. 49B is a sectional view takenalong line D-D′ shown in FIG. 49A;

FIG. 50A is a plan view showing the semiconductor memory deviceaccording to the sixth embodiment, FIG. 50B is a sectional view takenalong line E-E′ shown in FIG. 50A;

FIG. 51 is a plan view showing a method for manufacturing asemiconductor memory device according to a seventh embodiment;

FIG. 52 to FIG. 55 are plan views showing a method for manufacturing asemiconductor memory device according to an eighth embodiment;

FIG. 56 to FIG. 58 are plan views showing a method for manufacturing asemiconductor memory device according to a ninth embodiment;

FIG. 59 to FIG. 63 are plan views showing a method for manufacturing asemiconductor memory device according to a tenth embodiment;

FIG. 64A is a plan view showing the relationship between the controlgate electrode film and the slit in the tenth embodiment, FIG. 64B is aplan view showing the relationship between the upper select gate 21 uand the slit;

FIG. 65 to FIG. 69 are plan views showing a method for manufacturing asemiconductor memory device according to an eleventh embodiment;

FIG. 70 to FIG. 74 are plan views showing a method for manufacturing asemiconductor memory device according to a twelfth embodiment;

FIG. 75 to FIG. 79 are plan views showing a method for manufacturing asemiconductor memory device according to a thirteenth embodiment;

FIG. 80 to FIG. 82 are plan views showing a method for manufacturing asemiconductor memory device according to a fourteenth embodiment;

FIG. 83 to FIG. 87 are plan views showing a method for manufacturing asemiconductor memory device according to a fifteenth embodiment;

FIG. 88 to FIG. 90 are plan views showing a method for manufacturing asemiconductor memory device according to a sixteenth embodiment; and

FIG. 91 to FIG. 94 are plan views showing a method for manufacturing asemiconductor memory device according to a seventeenth embodiment.

DETAILED DESCRIPTION

According to one embodiment, a semiconductor memory device includes asubstrate, semiconductor pillars, a plurality of first electrode films,a second electrode film, a first insulating film, a second insulatingfilm, and a contact. The semiconductor pillars are provided on thesubstrate, extend in a first direction crossing an upper surface of thesubstrate, and are arranged along a second direction and a thirddirection being parallel to the upper surface and crossing each other.The first electrode films extend in the third direction. The secondelectrode film is provided between the semiconductor pillars and thefirst electrode films. The first insulating film is provided between thesemiconductor pillars and the second electrode film. The secondinsulating film is provided between the second electrode film and thefirst electrode films. The contact is provided at a position on thethird direction of the semiconductor pillars and is connected to thefirst electrode films. Two adjacent ones of the first electrode filmsare connected to each other.

(Common Configuration)

Various embodiments will be described hereinafter with reference to theaccompanying drawings.

The semiconductor device according to the embodiments described belowincludes a memory cell region Rm, a pullout region Rp, and a peripheralcircuit region Rc. The memory cell region Rm includes memory cellsarranged in three dimensions. The pullout region Rp pulls outinterconnects from the memory cell region Rm. The peripheral circuitregion Rc includes a driving circuit for operating the memory cellregion Rm.

In the embodiments described below, the memory cell region Rm and theperipheral circuit region Rc are nearly identical in configuration. Theyare different in the connection of interconnects between the memory cellregion Rm and the pullout region Rp. Furthermore, they are different inthe order of process steps in the manufacturing method. Theconfiguration of the memory cell region Rm and the peripheral circuitregion Rc will be described in details in the first embodiment. However,the configuration also applies to the other embodiments.

TABLE 1 lists the connection of interconnects and the order of processsteps in the embodiments. In TABLE 1, “MT” indicates a memory trench anda series of process steps for forming the memory trench. A siliconpillar is disposed along the inner surface of the memory trench. “ST”indicates a slit formed between the control gate electrode films and aseries of process steps for forming the slit. “SS” indicates a series ofprocess steps for cutting the end part of the select gate electrodefilm. “SSG” indicates a series of process steps for cutting the controlgate electrode film forming the gate electrode of an upper selecttransistor. Although not described in TABLE 1, a series of process stepsfor processing the silicon pillar is performed immediately after “MT”.

TABLE 1 Locations od short-circuited control gate Existence ProcessingPattern of electrode films of SS order MT, ST Embodiment Both sides ofYes MT→ST→ Equal length first ST SS→SSG ST elongated second on one sideST elongated third on both sides MT→SS→ Equal length fourth ST→SSG STelongated fifth on one side SS→MT→ Equal length sixth ST→SSG STelongated seventh on one side No (MT MT→ST→ Equal length eighth only)SSG ST elongated ninth on one side Both sides of Yes MT→ST→ Equal lengthtenth MT SS→SSG ST elongated eleventh on one side ST elongated twelfthon both sides MT→SS→ Equal length thirteenth ST→SSG ST elongatedfourteenth on one side SS→MT→ Equal length fifteenth ST→SSG ST elongatedsixteenth on one side No (ST MT→ST→ Equal length seventeenth only) SSG(First Embodiment)

First, a first embodiment is described.

FIG. 1 is a perspective view showing a semiconductor memory deviceaccording to the embodiment.

FIG. 2 is a sectional view showing the semiconductor memory deviceaccording to the embodiment.

FIG. 3 is a sectional view showing region A shown in FIG. 2.

FIG. 4 is a sectional view taken along line B-B′ shown in FIG. 2.

The X-direction range of the portion shown in FIG. 4 corresponds to theportion shown in FIG. 3.

As shown in FIG. 1 and FIG. 2, the semiconductor memory device 1according to the embodiment includes a silicon substrate Sub. A memorycell region Rm, a pullout region Rp, and a peripheral circuit region Rcare defined in the silicon substrate Sub. In the following, forconvenience of description, an XYZ orthogonal coordinate system is usedin the specification. Two directions parallel to the upper surface ofthe silicon substrate Sub and orthogonal to each other are referred toas “X-direction” and “Y-direction”. The direction perpendicular to theupper surface of the silicon substrate Sub is referred to as“Z-direction”.

First, the memory cell region Rm is described.

In the memory cell region Rm, an insulating film 11 made of e.g. siliconoxide, a conductive layer 12 made of e.g. polysilicon, an interconnectlayer 13 made of e.g. tungsten, and a conductive layer 14 made of e.g.polysilicon are stacked in this order on the silicon substrate Sub. Theconductive layer 12, the interconnect layer 13, and the conductive layer14 form a cell source line 15. An insulating film 17 made of e.g.silicon oxide is provided on the cell source line 15. A plurality ofsilicon pillars 20 extending in the Z-direction are provided on the cellsource line 15. The silicon pillar 20 is made of e.g. polysilicon. Thelower end of the silicon pillar 20 penetrates through the insulatingfilm 17 and is connected to the cell source line 15. As viewed in theZ-direction, the silicon pillars 20 are arranged in a matrix patternalong the X-direction and the Y-direction. For each block, the siliconpillars 20 are commonly connected to a single cell source line 15.

A plurality of control gate electrode films 21 are provided on thelateral side of the silicon pillar 20. The control gate electrode films21 are spaced from each other along the Z-direction. Each control gateelectrode film 21 is made of e.g. tungsten and extends in theY-direction. Thus, the control gate electrode film 21 is not disposedbetween the silicon pillars 20 arranged along the Y-direction. In theX-direction, two silicon pillars 20 and two control gate electrode films21 are alternately arranged. In other words, the silicon pillars 20arranged along the X-direction are grouped into a plurality of groups 22each composed of two adjacent silicon pillars 20. Two control gateelectrode films 21 are arranged so as to lie between the groups 22.Then, the control gate electrode film 21 is not disposed between the twosilicon pillars 20 belonging to each group 22.

An interlayer insulating film 23 made of e.g. silicon oxide is providedbetween the silicon pillars 20. An interlayer insulating film 24 made ofe.g. silicon oxide is provided between the control gate electrode films21 and below the lowermost control gate electrode film 21 and above theuppermost control gate electrode film 21. The plurality of control gateelectrode films 21, the interlayer insulating film 23, and theinterlayer insulating film 24 form a multilayer body 25. A hard mask 26is provided on the multilayer body 25.

The silicon pillar 20 is pulled out onto the hard mask 26 and connectedto an interconnect 27 extending in the X-direction. A via 28 is providedon the interconnect 27. A bit line 29 extending in the X-direction isprovided on the via 28. The bit line 29 is connected to the interconnect27 through the via 28. Thus, each silicon pillar 20 is connected betweenthe bit line 29 and the cell source line 15. That is, the semiconductormemory device 1 is a multilayer memory device of the I-shaped pillartype.

As shown in FIG. 3 and FIG. 4, a floating gate electrode film 31 made ofe.g. polysilicon is provided between the silicon pillar 20 and thecontrol gate electrode film 21. The floating gate electrode film 31 isprovided for each crosspoint of the silicon pillar 20 and the controlgate electrode film 21. Thus, the floating gate electrode films 31 arespaced from each other and arranged in a matrix pattern along theY-direction and the Z-direction. As viewed in the Z-direction, thefloating gate electrode film 31 is shaped like a sector spreading on thecontrol gate electrode film 21 side. Thus, the Y-direction length of theend part on the silicon pillar 20 side of the floating gate electrodefilm 31 is shorter than the Y-direction length of the end part on thecontrol gate electrode film 21 side of the floating gate electrode film31.

A tunnel insulating film 33 made of e.g. silicon oxide is providedbetween the silicon pillar 20 and the floating gate electrode film 31.The tunnel insulating film 33 is provided for each silicon pillar 20.The tunnel insulating film 33 is shaped like a strip extending in theZ-direction with the thickness direction being the X-direction and thewidth direction being the Y-direction.

On the other hand, a block insulating film 34 is provided between thefloating gate electrode film 31 and the control gate electrode film 21.The block insulating film 34 is a three-layer film in which a siliconnitride layer 35, a silicon oxide layer 36, and a silicon nitride layer37 are stacked in this order from the floating gate electrode film 31side toward the control gate electrode film 21 side. The silicon nitridelayer 35 is formed so as to surround the floating gate electrode film31. The silicon nitride layer 35 covers the upper surface 31 a and thelower surface 31 b of the floating gate electrode film 31. The siliconoxide layer 36 and the silicon nitride layer 37 are formed so as tosurround the control gate electrode film 21. The silicon oxide layer 36and the silicon nitride layer 37 cover the upper surface 21 a and thelower surface 21 b of the control gate electrode film 21.

The tunnel insulating film 33 is a film that is normally insulating.However, the tunnel insulating film 33 passes a tunnel current underapplication of voltage within the range of the driving voltage of thesemiconductor memory device 1. The block insulating film 34 is a filmpassing substantially no current even under application of voltagewithin the range of the driving voltage of the semiconductor memorydevice 1. The electrical film thickness (equivalent oxide thickness,EOT) of the tunnel insulating film 33 is thicker than the electricalfilm thickness of the block insulating film 34. The permittivity of thetunnel insulating film 33 is lower than the permittivity of the blockinsulating film.

Thus, a memory cell transistor is formed for each crosspoint of thesilicon pillar 20 and the control gate electrode film 21. The memorycell transistor includes the tunnel insulating film 33, the floatinggate electrode film 31, and the block insulating film 34. As describedabove, the floating gate electrode film 31 is surrounded with aninsulating film. The memory cell transistors are arranged in athree-dimensional matrix pattern along the X-direction, the Y-direction,and the Z-direction. The memory cell transistor is a transistor with thethreshold changed by accumulation of charge in the floating gateelectrode film 31. Thus, the memory cell transistor can store data.

Of the plurality of stages of memory cell transistors arranged along theZ-direction, one to several (e.g., four) stages of memory celltransistors from the top are used as upper select transistors. One toseveral (e.g., four) stages of memory cell transistors from the bottomare used as lower select transistors. The upper select transistor isused not to store data, but to select whether the bit line 29 isconnected to the silicon pillar 20. Likewise, the lower selecttransistor is used to select whether the cell source line 15 isconnected to the silicon pillar 20. The two control gate electrode films21 forming the upper select transistors in conjunction with the twosilicon pillars 20 belonging to a group 22 are pulled out to differentnodes. Thus, the upper select transistors formed respectively by the twosilicon pillars 20 belonging to the group 22 can be controlledindependently.

Next, the peripheral circuit region Rc is described.

As shown in FIG. 2, in the peripheral circuit region Rc, a source region40 s and a drain region 40 d are formed in the silicon substrate Subwith spacing from each other. The region between the source region 40 sand the drain region 40 d forms a channel region 40 c. A gate insulatingfilm 41 made of e.g. silicon oxide is provided on the silicon substrateSub and directly above the channel region 40 c. A conductive layer 42made of e.g. polysilicon and an interconnect layer 43 made of e.g.tungsten are stacked in this order on the gate insulating film 41. Theconductive layer 42 and the interconnect layer 43 form a gate electrode45. The source region 40 s, the drain region 40 d, the channel region 40c, the gate insulating film 41, and the gate electrode 45 form atransistor 46. The transistor 46 forms a driving circuit.

The insulating film 11 in the memory cell region Rm and the gateinsulating film 41 in the peripheral circuit region Rc are formed bydividing the same silicon oxide film. The conductive layer 12 in thememory cell region Rm and the conductive layer 42 in the peripheralcircuit region Rc are formed by dividing the same polysilicon layer. Theinterconnect layer 13 in the memory cell region Rm and the interconnectlayer 43 in the peripheral circuit region Rc are formed by dividing thesame tungsten layer.

Next, the pullout region Rp is briefly described.

As shown in FIG. 1, both Y-direction end parts of the multilayer body 25are processed into a staircase pattern. In each end part, a plurality ofcontrol gate electrode films 21 having an equal Z-direction position arebundled two by two, as described below. A contact 38 is provided on theend parts of each bundle of control gate electrode films 21. A word line39 extending in the Y-direction is provided on the contact 38. In theZ-direction, the position of the word line 39 is equal to the positionof the bit line 29. The word line 39 is connected to the control gateelectrode film 21 through the contact 38. In FIG. 1, an upper selectgate 21 u and a step configured with the upper select gate 21 u in thepullout region Rp described below are not shown. Next, a method formanufacturing a semiconductor memory device according to the embodimentis described.

FIG. 5 is a sectional view showing a method for manufacturing asemiconductor memory device according to the embodiment.

FIG. 6 is a plan view showing the method for manufacturing asemiconductor memory device according to the embodiment.

FIG. 7 is a sectional view showing the method for manufacturing asemiconductor memory device according to the embodiment.

FIG. 8 is a plan view showing the method for manufacturing asemiconductor memory device according to the embodiment.

FIG. 9 to FIG. 11 are sectional views showing the method formanufacturing a semiconductor memory device according to the embodiment.

FIG. 12 is a plan view showing the method for manufacturing asemiconductor memory device according to the embodiment.

FIG. 13 to FIG. 20 are sectional views showing the method formanufacturing a semiconductor memory device according to the embodiment.

FIG. 21 to FIG. 25 are plan views showing the method for manufacturing asemiconductor memory device according to the embodiment.

FIG. 26A is a plan view showing the relationship between the controlgate electrode film and the slit in the embodiment. FIG. 26B is a planview showing the relationship between the upper select gate 21 u and theslit.

The above plan views schematically show only some of the members forclarity of illustration. This also applies to the other embodimentsdescribed later.

First, as shown in FIG. 2, in the peripheral circuit region Rc, part ofthe driving circuit such as a source region 40 s and a drain region 40 dis formed in the upper portion of a silicon substrate Sub.

Next, as shown in FIG. 5, an insulating film 11 made of silicon oxide, aconductive layer 12 made of polysilicon, an interconnect layer 13 madeof tungsten, and a conductive layer 14 made of polysilicon are formed inthis order on the silicon substrate Sub. These layers are patterned foreach block by RIE (reactive ion etching). Thus, a cell source line 15 isformed for each block. On the other hand, in the peripheral circuitregion Rc, the divided insulating film 11 forms a gate insulating film41. The conductive layer 12 forms a conductive layer 42. Theinterconnect layer 13 forms an interconnect layer 43. The conductivelayer 42 and the interconnect layer 43 form a gate electrode 45.

Next, an insulating film 17 made of e.g. silicon oxide is formed on thecell source line 15. A stopper film 18 made of e.g. silicon nitride isformed on the insulating film 17.

Next, interlayer insulating films 24 made of silicon oxide andpolysilicon films 52 are alternately stacked on the stopper film 18.Thus, a multilayer body 25 is formed. At this time, the film thicknessratio of the interlayer insulating film 24 and the polysilicon film 52is adjusted depending on the film thickness of the block insulating film34 embedded on both sides. Next, a hard mask 26 made of e.g. siliconnitride is formed on the multilayer body 25.

Next, as shown in FIG. 6, both Y-direction end parts of the upper partof the multilayer body 25 are processed into a staircase pattern. Morespecifically, a step 70 is formed for each of one to several polysiliconfilms 52 from the top so that both Y-direction end parts of thepolysilicon film 52 located at a lower stage are pulled out farther tothe outside in the Y-direction. Alternatively, steps may be formed in amatrix pattern along the X-direction and the Y-direction.

Next, as shown in FIG. 7 and FIG. 8, the hard mask 26 is patterned in aline-and-space pattern by lithography technique. Next, the patternedhard mask 26 is used as a mask to perform anisotropic etching such asRIE on the multilayer body 25. Thus, a plurality of memory trenches MTare formed in the multilayer body 25. The longitudinal direction of thememory trench MT is the Y-direction. The memory trench MT penetratesthrough the multilayer body 25.

Next, as shown in FIG. 9, the polysilicon film 52 is recessed throughthe memory trench MT by isotropic etching such as wet etching. Thus, theexposed surface of the polysilicon film 52 is set back at the sidesurface of the memory trench MT to form a depression 54. The depression54 is formed like a loop along the side surface of the memory trench MT.

Next, as shown in FIG. 10, a thin silicon oxide layer 50 is formed onthe inner surface of the memory trench MT by oxidation processing. Next,a silicon nitride layer 35 is formed on the entire surface. Next, apolysilicon film 55 is formed on the entire surface. The silicon nitridelayer 35 and the polysilicon film 55 are formed also on the inner sidesurface of the memory trench MT and extend into the depression 54.

Next, as shown in FIG. 11 and FIG. 12, anisotropic etching such as RIEis performed along the memory trench MT. Thus, the polysilicon film 55and the silicon nitride layer 35 are selectively removed and left in thedepression 54. The polysilicon films 55 and the silicon nitride layers35 left in the depressions 54 adjacent in the Z-direction are dividedfrom each other. As viewed in the Z-direction, the polysilicon film 55and the silicon nitride layer 35 are formed like a loop along the sidesurface of the memory trench MT.

Next, as shown in FIG. 13, a tunnel insulating film 33 and a polysiliconfilm 56 are deposited in this order.

Next, as shown in FIG. 14, in the polysilicon film 56 and the tunnelinsulating film 33, the portion formed on the upper surface of the hardmask 26 and the portion formed on the bottom surface of the memorytrench MT are removed by RIE. Thus, the cell source line 15 is exposedat the bottom surface of the memory trench MT. Next, by depositingsilicon, the polysilicon film 56 is thickened and brought into contactwith the cell source line 15. Next, an amorphous silicon member 57 isembedded in the memory trench MT by depositing amorphous silicon dopedwith impurity. Thus, the memory trench MT is filled with the amorphoussilicon member 57.

Next, as shown in FIG. 15, etch-back is performed under the conditionsuch that the amorphous silicon member 57 is preferentially etchedrelative to the polysilicon film 56. Thus, the upper surface of theamorphous silicon member 57 is set back. Accordingly, the upper surfaceof the amorphous silicon member 57 is located below the upper surface ofthe hard mask 26. Furthermore, the portion of the polysilicon film 56formed on the upper surface of the hard mask 26 is also removed. Thus,the polysilicon film 56 is divided for each memory trench MT. Next, apolysilicon film 27 a is formed on the entire surface.

Next, as shown in FIG. 16, RIE is performed using a mask (not shown)having a line-and-space pattern extending in the X-direction. Thus, thepolysilicon film 27 a is selectively removed and processed into a lineextending in the X-direction. Furthermore, the polysilicon film 55, thetunnel insulating film 33, the polysilicon film 56, and the amorphoussilicon member 57 are selectively removed to form holes (not shown)reaching the cell source line 15. As viewed in the Z-direction, theseholes are arranged in a matrix pattern along the X-direction and theY-direction. In FIG. 16, these holes are formed behind and before thepage. Thus, the polysilicon film 55 is divided along the Y-direction toform a floating gate electrode film 31. The polysilicon film 56 is alsodivided along the Y-direction to form a silicon pillar 20.

Next, the residual portion of the amorphous silicon member 57 (see FIG.15) is removed through the hole by wet etching. In FIG. 16, it isremoved from behind and before the page. Next, by depositing siliconoxide, an interlayer insulating film 23 is embedded in the space formedby the removal of the amorphous silicon member 57 and in the hole. InFIG. 16, the amorphous silicon member 57 is removed, and the interlayerinsulating film 23 is embedded, from behind and before the page.

Next, as shown in FIG. 17, the polysilicon film 27 a is divided alongthe X-direction by lithography technique and RIE technique. Thus, thepolysilicon film 27 a is cut for each silicon pillar 20. As a result,the polysilicon film 27 a is divided in both the X-direction and theY-direction to form a plurality of interconnects 27 arranged in a matrixpattern.

Next, as shown in FIG. 18, a hard mask 59 is formed on the hard mask 26so as to embed the interconnect 27. Next, a mask (not shown) is formedby lithography technique. The mask includes a plurality of openings withthe longitudinal direction being the Y-direction. Next, this mask isused to perform RIE with the stopper film 18 used as a stopper. Thus, aslit ST is formed in the portion of the multilayer body 25, the hardmask 26, and the hard mask 59 between the memory trenches MT. Thelongitudinal direction of the slit ST is the Y-direction. The memorytrenches MT and the slits ST are alternately arranged along theX-direction. In the Y-direction, the length of the slit ST is equal tothe length of the memory trench MT. Both longitudinal end parts of theslit ST are located at the same position as both longitudinal end partsof the memory trench MT.

Next, as shown in FIG. 19, the polysilicon film 52 is removed throughthe slit ST by e.g. wet etching. Thus, a depression 61 is formed at theside surface of the slit ST. This etching is stopped by the siliconoxide layer 50 exposed at the rear surface of the depression 61. Thesilicon nitride layer 35 is not damaged because it is protected by thesilicon oxide layer 50. As viewed in the Z-direction, the depression 61formed like a loop along the side surface of the slit ST.

Next, as shown in FIG. 20 and FIG. 21, the silicon oxide layer 50 (seeFIG. 19) exposed at the rear surface of the depression 61 is removed.Thus, the silicon nitride layer 35 is exposed at the rear surface of thedepression 61. Next, a silicon oxide layer 36 and a silicon nitridelayer 37 are formed on the inner surface of the slit ST. As a result, asshown in FIG. 3, the silicon nitride layer 35, the silicon oxide layer36, and the silicon nitride layer 37 form a block insulating film 34. InFIG. 20, the silicon oxide layer 36 and the silicon nitride layer 37 areshown as a single insulating layer. The floating gate electrode film 31is shown as being divided along the Y-direction. However, in FIG. 21, itis shown as a region shaped like a continuous loop. This also applies tothe subsequent similar plan views.

In this phase, the inner surface of the depression 61 is covered withthe block insulating film 34 also in both longitudinal end parts of theslit ST. Thus, even if a tungsten film 63 is formed so as to embed thedepression 61 in the next process step, no electrical connection can beformed with the polysilicon film 52 of the pullout region Rp.Accordingly, a photoresist pattern exposing both end parts of the slitST and covering the other region is formed. This photoresist pattern isused as a mask to perform wet etching or dry etching. Thus, the blockinsulating film 34 is removed from above the inner surface of thedepression 61 in both end parts of the slit ST.

Next, a tungsten film 63 is formed on the entire surface by e.g. CVD(chemical vapor deposition) technique. The tungsten film 63 extends alsointo the depression 61 through the slit ST. The tungsten film 63 isinsulated from the floating gate electrode film 31 by the blockinsulating film 34. However, the tungsten film 63 is connected to thepolysilicon film 52 in both end parts of the slit ST.

Next, in the tungsten film 63, the silicon nitride layer 37, and thesilicon oxide layer 36, the portion deposited outside the depression 61is removed by anisotropic etching such as RIE. Thus, the tungsten film63, the silicon nitride layer 37, and the silicon oxide layer 36 areleft in the depression 61. Furthermore, the tungsten films 63 left inthe depressions 61 adjacent in the Z-direction are divided from eachother. As a result, a control gate electrode film 21 made of thetungsten film 63 is formed in the depression 61. At this time, thecontrol gate electrode film 21 is formed like a loop along the sidesurface of the slit ST. In both longitudinal end parts of the slit ST,the control gate electrode film 21 is connected to the polysilicon film52. In the following description, the polysilicon film 52 of the pulloutregion Rp is also described as part of the “control gate electrode film21”. Then, an interlayer insulating film 65 is embedded in the slit ST,and the upper surface is planarized.

Next, as shown in FIG. 22, a slit SS penetrating through the multilayerbody 25 is formed by anisotropic etching such as RIE. The slit SSincludes a plurality of rectangular portions with the longitudinaldirection being the X-direction, and a frame portion surrounding eachblock. The plurality of rectangular portions are alternately disposed onboth Y-direction sides of the slit ST. Each rectangular portion islinked with one Y-direction end part of each of two adjacent memorytrenches MT. In this case, the longitudinal central part of eachrectangular portion is linked also to one Y-direction end part of theslit ST. Thus, one Y-direction end part of the loop-shaped control gateelectrode film 21 surrounding the slit ST is removed. In the twoloop-shaped control gate electrode films 21 surrounding adjacent slitsST, end parts on mutually different sides in the Y-direction are cut.

Thus, the loop of the control gate electrode film 21 surrounding theslit ST is cut at one site. As viewed in the Z-direction, the controlgate electrode film 21 is U-shaped. Furthermore, the frame portion ofthe slit SS partitions the control gate electrode film 21 for eachblock. Inside the block, two control gate electrode films 21 disposed onboth sides in the width direction (X-direction) of the memory trench MTare electrically isolated from each other. In other words, two controlgate electrode films 21 disposed on both sides in the width direction(X-direction) of each slit ST and extending linearly in the Y-directionare short-circuited with each other. The connecting portion in which twocontrol gate electrode films 21 are connected to each other is locatedbetween the silicon pillars 20. Then, an insulating material such assilicon oxide is embedded in the slit SS.

Next, as shown in FIG. 23, a slit SSG is formed in the region on bothY-direction sides of the memory trench MT and the slit ST by anisotropicetching such as RIE. The slit SSG is formed in the upper part of themultilayer body 25, and not formed in its lower part. Thus, of theplurality of control gate electrode films 21 stacked in the Z-direction,only one or more (e.g., four) control gate electrode films 21 formingthe gate electrode of the upper select transistor are cut by the slitSSG. In the following, this control gate electrode film 21 forming thegate electrode of the upper select transistor is also referred to as“upper select gate 21 u”. On the other hand, the control gate electrodefilms 21 located in the lower part of the multilayer body 25 and formingthe gate electrode of the memory cell transistor and the lower selecttransistor are not cut by the slit SSG.

The slit SSG includes two comb-shaped portions. Each comb-shaped portionincludes one base part SSGb and a plurality of tooth parts SSGt. Thebase part SSGb has a linear shape extending in the X-direction. Thetooth part SSGt has a linear shape pulled out from the base part SSGb inthe Y-direction. In each comb-shaped portion, the tooth part SSGt isformed for each slit ST. The tip of the tooth part SSGt is extended tothe silt ST. Thus, of the Y-direction end parts of the upper select gate21 u surrounding the slit ST, the end part not cut by the slit SS is cutby the tooth part SSGt of the slit SSG. That is, the upper select gate21 u originally shaped like a loop is processed into generally linearportions extending in the Y-direction by being cut at two sites by theslit SS and the tooth part SSGt. Thus, the upper select gate 21 u isdivided for each row of silicon pillars 20 arranged along theY-direction. On the other hand, the control gate electrode films 21other than the upper select gate 21 u are not cut by the slit SSG. Thus,two control gate electrode films 21 sandwiching the slit ST remainshort-circuited with each other. Then, an insulating material such assilicon oxide is embedded in the slit SSG.

Next, both Y-direction end parts of the portion except the upper part ofthe multilayer body 25 are processed into a staircase pattern. Morespecifically, a step 70 is formed for each control gate electrode film21 so that both Y-direction end parts of the control gate electrode film21 located at a lower stage are pulled out farther to the outside in theY-direction. Alternatively, steps may be formed in a matrix patternalong the X-direction and the Y-direction. Here, FIG. 23 shows only thesteps 70 formed corresponding to the upper select gate 21 u.

Next, as shown in FIG. 24, an upper select contact CS is formed for eachstep 70 corresponding to the upper select gate 21 u. Each upper selectcontact CS is connected to the corresponding upper select gate 21 u.

Next, as shown in FIG. 25, a word line contact CW is formed outside theslit SSG. Each word line contact CW is connected to the correspondingcontrol gate electrode film 21 other than the upper select gate 21 u. InFIG. 1, the upper select contact CS and the word line contact CW arecollectively shown as contacts 38.

Next, as shown in FIG. 1, vias 28 are formed. Then, bit lines 29 andword lines 39 are formed. Thus, the semiconductor memory device 1according to the embodiment is manufactured. In FIG. 1, the upper selectgate 21 u is not shown.

As shown in FIG. 26A, after the control gate electrode film 21 is formedaround the slit ST, one longitudinal (Y-direction) end part of the slitST is removed by the slit SS. Thus, two control gate electrode films 21sandwiching the slit ST are short-circuited with each other.

As shown in FIG. 26B, the upper select gate 21 u formed in the upperpart of the multilayer body 25 is further cut by the silt SSG. Thus, theupper select gate 21 u is divided into line-shaped portions extending inthe Y-direction.

In FIG. 26A and FIG. 26B, for clarity of illustration, the control gateelectrode film 21 and the upper select gate 21 u are hatched.

Next, the effect of the embodiment is described.

According to the embodiment, memory trenches MT and slits ST are formedin the multilayer body 25. A floating gate electrode film 31 is formedfrom the memory trench MT side. A control gate electrode film 21 isformed from the slit ST side. Thus, the embodiment can manufacture amemory device in which memory cells are integrated in three dimensionsand a floating gate electrode film 31 made of a conductive material isprovided for each memory cell.

According to the embodiment, the control gate electrode film 21 locatedat the position sandwiching the memory trench MT can be separated byonly one formation of the slit SS. Furthermore, the upper select gate 21u can be separated for each row of silicon pillars 20 extending in theY-direction by only one formation of the slit SSG. Thus, according tothe embodiment, a structure for pulling out interconnects from thememory cell region Rm can be formed by a small number of process steps.

(Second Embodiment)

Next, a second embodiment is described.

The embodiment is different from the above first embodiment in that oneend part of the slit ST is elongated.

FIG. 27 to FIG. 31 are plan views showing a method for manufacturing asemiconductor memory device according to the embodiment.

In the following description, the portions different from those of thefirst embodiment are primarily described. The portions similar to thoseof the first embodiment are not described, or briefly described.

First, as shown in FIG. 27, a multilayer body 25 is formed on a siliconsubstrate Sub. Both Y-direction end parts in the upper part of themultilayer body 25 are processed into a staircase pattern. A pluralityof memory trenches MT extending in the Y-direction are formed in themultilayer body 25. Specifically, the process shown in FIG. 5 to FIG. 17is performed.

Next, as shown in FIG. 28, a slit ST is formed in the portion of themultilayer body 25 between the memory trenches MT. Specifically, theprocess shown in FIG. 18 to FIG. 20 is performed. At this time, incontrast to the first embodiment, in the Y-direction, the slit ST ismade longer than the memory trench MT. In the Y-direction, both endparts 71 a and 71 b of the slit ST are alternately projected relative toboth end parts 72 a and 72 b of the memory trench MT. The end part ofthe slit ST on the non-projected side is disposed at the same positionas the end part of the memory trench MT.

Next, as shown in FIG. 29, a slit SS is formed in the multilayer body25. Thus, the control gate electrode film 21 formed like a loop alongthe side surface of the slit ST is cut in the non-projected end part ofthe slit ST. On the other hand, the control gate electrode film 21 isnot cut in the projected end part of the slit ST. Then, an insulatingmaterial is embedded in the slit SS.

Next, as shown in FIG. 30, a slit SSG is formed in the upper part of themultilayer body 25. At this time, a tooth part SSGt of the slit SSG isformed for each of both end parts of the slit ST. The tip part of thetooth part SSGt is extended into the projected end part 71 a of the slitST. Then, an insulating material is embedded in the slit SSG.

Next, as shown in FIG. 31, both Y-direction end parts of the portionexcept the upper part of the multilayer body 25 are processed into astaircase pattern. Then, an upper select contact CS is formed andconnected to the upper select gate 21 u. A word line contact CW isformed and connected to each control gate electrode film 21 other thanthe upper select gate 21 u.

The subsequent manufacturing method is similar to that of the abovefirst embodiment. That is, as shown in FIG. 1, word lines 39 and bitlines 29 are formed. Thus, the semiconductor memory device 2 accordingto the embodiment is manufactured. In the semiconductor memory device 2,the connecting portion in which two control gate electrode films 21 areconnected to each other is located between the silicon pillar 20 and thecontact 38 in the Y-direction.

The configuration, manufacturing method, and effect of the embodimentother than the foregoing are similar to those of the above firstembodiment.

(Variation of the Second Embodiment)

Next, a variation of the second embodiment is described.

FIG. 32 is a plan view showing a method for manufacturing asemiconductor memory device according to the variation.

As shown in FIG. 32, in the variation, the projected end part, e.g., endpart 71 b, of the slit ST is made thicker than the rest of the slit ST.This can provide a larger margin for alignment between the side surfaceof the end part 71 b and the side surface of the tooth part SSGt whenthe tooth part SSGt is extended into the projected end part 71 b. Theconfiguration, manufacturing method, and effect of the variation otherthan the foregoing are similar to those of the above second embodiment.

(Third Embodiment)

Next, a third embodiment is described.

The embodiment is different from the above first embodiment in that bothend parts of the slit ST are elongated.

FIG. 33 to FIG. 37 are plan views showing a method for manufacturing asemiconductor memory device according to the embodiment.

First, as shown in FIG. 33, both Y-direction end parts in the upper partof the multilayer body 25 are processed into a staircase pattern. Then,a plurality of memory trenches MT extending in the Y-direction areformed in the multilayer body 25. Specifically, the process shown inFIG. 5 to FIG. 17 is performed.

Next, as shown in FIG. 34, a slit ST is formed in the portion of themultilayer body 25 between the memory trenches MT. Specifically, theprocess shown in FIG. 17 to FIG. 19 is performed. At this time, in theY-direction, the slit ST is made longer than the memory trench MT. Bothend parts 71 a and 71 b of the slit ST are projected relative to bothend parts 72 a and 72 b of the memory trench MT.

Next, as shown in FIG. 35, a slit SS is formed in the multilayer body25. At this time, the slit SS is caused to alternately traverse theportion on the central part side of both end parts of the slit ST. Thatis, one slit ST is traversed near the end part 71 a, whereas itsadjacent slit ST is traversed near the end part 71 b. Thus, the controlgate electrode film 21 formed like a loop along the side surface of theslit ST is cut at one site. At this time, a U-shaped portion 21 c isformed in the end part on the cut side of the control gate electrodefilm 21. The U-shaped portion 21 c is opened on the side of the linearportion extending in the Y-direction. Then, an insulating material isembedded in the slit SS.

Next, as shown in FIG. 36, a slit SSG is formed in the upper part of themultilayer body 25. At this time, a tooth part SSGt of the slit SSG isformed for each of both end parts of the slit ST. The tooth parts SSGtare extended into both end parts of the slit ST. Then, an insulatingmaterial is embedded in the slit SSG.

Next, as shown in FIG. 37, both Y-direction end parts of the portionexcept the upper part of the multilayer body 25 are processed into astaircase pattern. Then, an upper select contact CS is formed andconnected to the upper select gate 21 u. A word line contact CW isformed and connected to each control gate electrode film 21 other thanthe upper select gate 21 u.

The subsequent manufacturing method is similar to that of the abovefirst embodiment. That is, as shown in FIG. 1, word lines 39 and bitlines 29 are formed. Thus, the semiconductor memory device 3 accordingto the embodiment is manufactured.

The configuration, manufacturing method, and effect of the embodimentother than the foregoing are similar to those of the above firstembodiment.

(Fourth Embodiment)

Next, a fourth embodiment is described.

The embodiment is different from the above first embodiment in that theslit SS is formed before the slit ST.

FIG. 38 to FIG. 41 are plan views showing a method for manufacturing asemiconductor memory device according to the embodiment.

First, as shown in FIG. 38, both Y-direction end parts in the upper partof the multilayer body 25 are processed into a staircase pattern. Then,a plurality of memory trenches MT are formed in the multilayer body 25.The longitudinal direction of the memory trench MT is the Y-direction.Then, an insulating material is embedded in the memory trench MT.

Next, as shown in FIG. 39, a slit SS is formed in the multilayer body25. The slit SS links the end parts of adjacent memory trenches MT witheach other. At this time, for three memory trenches MT arrangedconsecutively, the first memory trench MT and the second memory trenchMT are linked with each other on one end part side, whereas the secondmemory trench MT and the third memory trench MT are linked with eachother on the other end part side. Then, an insulating material isembedded in the slit SS.

Next, as shown in FIG. 40, a slit ST is formed in the portion of themultilayer body 25 surrounded on three sides with two memory trenches MTand one slit SS. The longitudinal direction of the slit ST is theY-direction. At this time, the end part of the slit ST is configured soas not to be projected relative to the end part of the memory trench MTin the Y-direction. Then, an insulating material is embedded in the slitST.

Next, as shown in FIG. 41, a slit SSG is formed in the upper part of themultilayer body 25. At this time, a tooth part SSGt of the slit SSG isformed for each of both end parts of the slit ST. The tooth parts SSGtare extended into both end parts of the slit ST. Then, an insulatingmaterial is embedded in the slit SSG.

The subsequent manufacturing method is similar to that of the abovefirst embodiment. That is, both Y-direction end parts of the portion ofthe multilayer body 25 other than the upper part are processed into astaircase pattern. An upper select contact CS and a word line contact CWare formed. Word lines 39 and bit lines 29 are formed. Thus, thesemiconductor memory device 4 according to the embodiment ismanufactured.

The configuration, manufacturing method, and effect of the embodimentother than the foregoing are similar to those of the above firstembodiment.

(Fifth Embodiment)

Next, a fifth embodiment is described.

The embodiment is different from the above fourth embodiment in that oneend part of the slit ST is elongated.

FIG. 42 is a plan view showing a method for manufacturing asemiconductor memory device according to the embodiment.

First, as shown in FIG. 38 and FIG. 39, a multilayer body 25 is formed.Both Y-direction end parts in the upper part of the multilayer body 25are processed into a staircase pattern. Next, a memory trench MT and aslit SS are formed in the multilayer body 25.

Next, as shown in FIG. 42, a slit ST is formed in the multilayer body25. At this time, the slit ST is made longer than the memory trench MT.From the portion surrounded on three sides with two memory trenches MTand one slit SS, the slit ST is extended out to the side in theY-direction where the slit SS does not exist.

Next, as shown in FIG. 41, a slit SSG is formed in the multilayer body25.

The subsequent manufacturing method is similar to that of the abovefourth embodiment. Thus, the semiconductor memory device according tothe embodiment is manufactured. The configuration, manufacturing method,and effect of the embodiment other than the foregoing are similar tothose of the above first embodiment.

(Sixth Embodiment)

Next, a sixth embodiment is described.

The embodiment is different from the above first embodiment in that theslit SS is formed before the memory trench MT.

FIG. 43 to FIG. 47 are plan views showing a method for manufacturing asemiconductor memory device according to the embodiment.

FIG. 48A is a plan view showing a semiconductor memory device accordingto the embodiment. FIG. 48B is a sectional view taken along line C-C′shown in FIG. 48A.

FIG. 49A is a plan view showing the semiconductor memory deviceaccording to the embodiment. FIG. 49B is a sectional view taken alongline D-D′ shown in FIG. 49A.

FIG. 50A is a plan view showing the semiconductor memory deviceaccording to the embodiment. FIG. 50B is a sectional view taken alongline E-E′ shown in FIG. 50A.

The aforementioned plan views and sectional views show correspondingpositions. However, the positions are not exactly matched.

First, as shown in FIG. 5, a multilayer body 25 is formed on a siliconsubstrate Sub. Next, both Y-direction end parts in the upper part of themultilayer body 25 are processed into a staircase pattern.

Next, as shown in FIG. 43, a plurality of slits SS are formed in themultilayer body 25. Each slit SS is shaped like a rectangle with thelongitudinal direction being the X-direction. Two rows of slits SS areformed with spacing in the Y-direction. The row includes a plurality ofslits SS periodically arranged along the X-direction. Between the rows,the phase of the arrangement of slits SS is shifted by half the period.Then, silicon oxide is embedded in the slit SS.

Next, as shown in FIG. 44 and FIG. 6, a plurality of memory trenches MTextending in the Y-direction are formed in the multilayer body 25. Atthis time, both end parts of the memory trench MT are disposed near theslit SS, but not linked with the slit SS.

Next, as shown in FIG. 44 and FIG. 8, the polysilicon film 52 isrecessed through the memory trench MT by wet etching to form adepression 54. At this time, the silicon oxide embedded in the slit SSis used as a stopper. Next, the process shown in FIG. 9 to FIG. 16 isperformed to form silicon pillars 20 and the like.

Next, as shown in FIG. 45, a slit ST is formed in the portion of themultilayer body 25 surrounded on three sides with two memory trenches MTand one slit SS. At this time, the end part of the slit ST is configuredso as not to be projected relative to the end part of the memory trenchMT in the Y-direction. Then, an insulating material is embedded in theslit ST.

Next, as shown in FIG. 46, a slit SSG is formed in the upper part of themultilayer body 25. At this time, a tooth part SSGt of the slit SSG isformed for each of both end parts of the slit ST. The tooth parts SSGtare extended into both end parts of the slit ST. Then, an insulatingmaterial is embedded in the slit SSG.

Next, as shown in FIG. 47, both Y-direction end parts of the portion ofthe multilayer body 25 other than the upper part are processed into astaircase pattern. An upper select contact CS and a word line contact CWare formed.

Next, contacts 38, word lines 39, and bit lines 29 (see FIG. 1) areformed.

Thus, as shown in FIG. 48A and FIG. 48B, FIG. 49A and FIG. 49B, and FIG.50A and FIG. 50B, in the semiconductor memory device 6 according to theembodiment, the control gate electrode film 21 formed in the slit ST ispulled out to the end part of the multilayer body 25 and connected tothe upper select contact CS or the word line contact CW. In theembodiment, the silicon pillar 20 is divided only in the longitudinaldirection (Y-direction) of the memory trench MT. The silicon pillar 20is not divided in the width direction (X-direction), but provided overthe entire length in the width direction.

The configuration, manufacturing method, and effect of the embodimentother than the foregoing are similar to those of the above firstembodiment.

(Seventh Embodiment)

Next, a seventh embodiment is described.

The embodiment is different from the above sixth embodiment in that oneend part of the slit ST is elongated.

FIG. 51 is a plan view showing a method for manufacturing asemiconductor memory device according to the embodiment.

First, as in the above sixth embodiment, as shown in FIG. 43 and FIG.44, a slit SS and a memory trench MT are formed in the multilayer body25.

Next, as shown in FIG. 51, a slit ST is formed in the multilayer body25. At this time, the slit ST is made longer than the memory trench MT.From the portion surrounded on three sides with two memory trenches MTand one slit SS, one end part of the slit ST is extended out to the sidein the Y-direction where the slit SS does not exist.

The subsequent manufacturing method is similar to that of the abovesixth embodiment. Thus, the semiconductor memory device according to theembodiment is manufactured.

The configuration, manufacturing method, and effect of the embodimentother than the foregoing are similar to those of the above sixthembodiment.

(Eighth Embodiment)

Next, an eighth embodiment is described.

In the embodiment, a memory trench MT is formed in the region in whichthe memory trench MT and the slit SS are formed in the above sixthembodiment (see FIG. 44). That is, the memory trench MT is configured todouble as a slit SS.

FIG. 52 to FIG. 55 are plan views showing a method for manufacturing asemiconductor memory device according to the embodiment.

As shown in FIG. 52, the upper part of the multilayer body 25 isprocessed into a staircase pattern. Then, a memory trench MT is formedin the multilayer body 25. The memory trench MT includes a frame portionand a corrugated portion. The frame portion is formed so as to partitionone block. The corrugated portion is formed inside the frame portion soas to extend in the X-direction while reciprocating along theY-direction. Next, silicon pillars 20 and the like are formed along theside surface of the memory trench MT. Silicon oxide is embedded in thememory trench MT.

Next, as shown in FIG. 53, a slit ST is formed in the portion of themultilayer body 25 surrounded on three sides with the memory trench MT.At this time, in the Y-direction, the length of the slit ST is madeequal to the length of the linear portion of the memory trench MT. Then,an insulating material is embedded in the slit ST.

Next, as shown in FIG. 54, a slit SSG is formed in the upper part of themultilayer body 25. At this time, a tooth part SSGt of the slit SSG isformed for each of both end parts of the slit ST. The tooth parts SSGtare extended into both end parts of the slit ST. Then, an insulatingmaterial is embedded in the slit SSG.

Next, as shown in FIG. 55, both Y-direction end parts of the portion ofthe multilayer body 25 other than the upper part are processed into astaircase pattern. An upper select contact CS and a word line contact CWare formed.

Next, word lines 39 and bit lines 29 (see FIG. 1) are formed. Thus, thesemiconductor memory device 8 according to the embodiment ismanufactured.

The configuration, manufacturing method, and effect of the embodimentother than the foregoing are similar to those of the above firstembodiment.

(Ninth Embodiment)

Next, a ninth embodiment is described.

The embodiment is different from the above eighth embodiment in that oneend part of the slit ST is elongated.

FIG. 56 to FIG. 58 are plan views showing a method for manufacturing asemiconductor memory device according to the embodiment.

First, as in the above eighth embodiment, as shown in FIG. 56, a memorytrench MT is formed in the multilayer body 25. The memory trench MTincludes a frame portion and a corrugated portion.

Next, as shown in FIG. 57, a slit ST is formed in the multilayer body25. At this time, the slit ST is made longer than the memory trench MT.From the portion surrounded on three sides with the corrugated portionof the memory trenches MT, one end part of the slit ST is extended outto the side in the Y-direction where the memory trench MT does notexist.

Next, as shown in FIG. 58, a slit SSG is formed in the upper part of themultilayer body 25.

The subsequent manufacturing method is similar to that of the aboveeighth embodiment. Thus, the semiconductor memory device 9 according tothe embodiment is manufactured.

The configuration, manufacturing method, and effect of the embodimentother than the foregoing are similar to those of the above sixthembodiment.

In the embodiment, as in the above variation (see FIG. 32) of the secondembodiment, the extended portion of the slit ST may be formed thickerthan the other portion. This can provide a larger margin for alignmentwhen the slit SSG is formed.

(Tenth Embodiment)

Next, a tenth embodiment is described.

The embodiment is different from the above first embodiment in that twocontrol gate electrode films 21 disposed on both sides of the memorytrench MT are short-circuited.

FIG. 59 to FIG. 63 are plan views showing a method for manufacturing asemiconductor memory device according to the embodiment.

FIG. 64A is a plan view showing the relationship between the controlgate electrode film and the slit in the embodiment. FIG. 64B is a planview showing the relationship between the upper select gate 21 u and theslit.

In FIG. 64A and FIG. 64B, for clarity of illustration, the control gateelectrode film 21 and the upper select gate 21 u are hatched.

First, as shown in FIG. 59, a plurality of memory trenches MT extendingin the Y-direction are formed in the multilayer body 25.

Next, as shown in FIG. 60, a slit ST extending in the Y-direction isformed in the portion of the multilayer body 25 between the memorytrenches MT. In the Y-direction, the length of the slit ST is made equalto the length of the memory trench MT. Both end parts of the slit ST arelocated at the same position as both end parts of the memory trench MT.So far, the embodiment is similar to the above first embodiment.

Next, as shown in FIG. 61, a plurality of slits SS are formed in themultilayer body 25. The slit SS includes a plurality of rectangularportions and a frame portion. The longitudinal direction of therectangular portion is the X-direction. The frame portion surrounds eachblock. At this time, in contrast to the first embodiment, therectangular portion of the slit SS is formed so as to link two adjacentslits ST with each other on one end part side in the Y-direction. Inthis case, the longitudinal central part of each rectangular portion islinked also with one Y-direction end part of the memory trench MT. Thus,the control gate electrode film 21 shaped like a loop surrounding theslit ST is cut in both Y-direction end parts. Accordingly, the loop ofthe control gate electrode film 21 surrounding the slit ST is cut at twosites and divided into two linear portions. On the other hand, twocontrol gate electrode films 21 sandwiching the memory trench MT areshort-circuited with each other by a polysilicon member processedsimultaneously with the silicon pillar 20. Then, an insulating materialsuch as silicon oxide is embedded in the slit SS.

Next, as shown in FIG. 62, a slit SSG is formed in the upper part of themultilayer body 25. At this time, in contrast to the first embodiment,the tooth part SSGt of the slit SSG is extended into both end parts ofthe memory trench MT, rather than the slit ST. Then, an insulatingmaterial is embedded in the slit SSG.

Next, as shown in FIG. 63, both Y-direction end parts of the portion ofthe multilayer body 25 other than the upper part are processed into astaircase pattern. An upper select contact CS and a word line contact CWare formed.

Next, word lines 39 and bit lines 29 (see FIG. 1) are formed.

Thus, the semiconductor memory device 10 according to the embodiment ismanufactured.

As shown in FIG. 64A, after the control gate electrode film 21 is formedaround the slit ST, both longitudinal (Y-direction) end parts of theslit ST are removed by the slit SS. Thus, two control gate electrodefilms 21 sandwiching the slit ST are isolated from each other. Twocontrol gate electrode films 21 sandwiching the memory trench MT areshort-circuited with each other.

As shown in FIG. 64B, the upper select gate 21 u formed in the upperpart of the multilayer body 25 is further cut by the silt SSG at theposition of the memory trench MT. Thus, the upper select gate 21 u isdivided into line-shaped portions extending in the Y-direction.

In the semiconductor memory device 10, two control gate electrode films21 disposed at the position sandwiching the memory trench MT areshort-circuited. However, the upper select gate 21 u is divided for eachportion sandwiched by the memory trench MT and the slit ST.

The configuration, manufacturing method, and effect of the embodimentother than the foregoing are similar to those of the above firstembodiment.

(Eleventh Embodiment)

Next, an eleventh embodiment is described.

The embodiment is a combination of the tenth embodiment and the secondembodiment described above.

FIG. 65 to FIG. 69 are plan views showing a method for manufacturing asemiconductor memory device according to the embodiment.

First, as shown in FIG. 65, both Y-direction end parts of the upper partof the multilayer body 25 are processed into a staircase pattern. Then,a plurality of memory trenches MT extending in the Y-direction areformed. Specifically, the process shown in FIG. 7 to FIG. 17 isperformed.

Next, as shown in FIG. 66, a slit ST is formed in the multilayer body25. Specifically, the process shown in FIG. 18 to FIG. 20 is performed.At this time, the slit ST is made longer than the memory trench MT. Oneend part of the slit ST is alternately extended out from the regionbetween the adjacent memory trenches MT.

Next, as shown in FIG. 67, a slit SS is formed in the multilayer body25. The rectangular portion of the slit SS is formed so as to link theslits ST with each other on one end part side. Thus, the control gateelectrode film 21 shaped like a loop surrounding each slit ST is splitinto two.

Next, as shown in FIG. 68, a slit SSG is formed in the upper part of themultilayer body 25. The tooth part SSGt of the slit SSG is extended intoboth end parts of the memory trench MT.

Next, as shown in FIG. 69, both Y-direction end parts of the portion ofthe multilayer body 25 other than the upper part are processed into astaircase pattern. An upper select contact CS and a word line contact CWare formed. Next, word lines 39 and bit lines 29 (see FIG. 1) areformed. Thus, the semiconductor memory device 81 according to theembodiment is manufactured. As shown in FIG. 67, in the semiconductormemory device 81 according to the embodiment, two control gate electrodefilms 21 disposed on both sides of the memory trench MT areshort-circuited. Furthermore, one end part of the slit ST is elongated.

The configuration, manufacturing method, and effect of the embodimentother than the foregoing are similar to those of the tenth embodiment.

(Twelfth Embodiment)

Next, a twelfth embodiment is described.

The embodiment is a combination of the tenth embodiment and the thirdembodiment described above.

FIG. 70 to FIG. 74 are plan views showing a method for manufacturing asemiconductor memory device according to the embodiment.

First, as shown in FIG. 70, both Y-direction end parts of the upper partof the multilayer body 25 are processed into a staircase pattern. Then,a plurality of memory trenches MT extending in the Y-direction areformed.

Next, as shown in FIG. 71, a slit ST is formed in the multilayer body25. At this time, the slit ST is made longer than the memory trench MT.Both end parts of the slit ST are extended out from the region betweenthe adjacent memory trenches MT.

Next, as shown in FIG. 72, a slit SS is formed in the multilayer body25. The rectangular portion of the slit SS is formed so as to link theslits ST with each other on one end part side. However, the longitudinalcentral part of the slit SS is superposed on one end part of the memorytrench MT. Thus, the control gate electrode film 21 shaped like a loopsurrounding each slit ST is split into two.

Next, as shown in FIG. 73, a slit SSG is formed in the upper part of themultilayer body 25. The tooth part SSGt of the slit SSG is extended intoone end part of the memory trench MT, and into the slit SS disposed onthe other end part side of the memory trench MT.

Next, as shown in FIG. 74, both Y-direction end parts of the portion ofthe multilayer body 25 other than the upper part are processed into astaircase pattern. An upper select contact CS and a word line contact CWare formed. Thus, the semiconductor memory device 82 according to theembodiment is manufactured.

As shown in FIG. 74, in the semiconductor memory device 82 according tothe embodiment, two control gate electrode films 21 disposed on bothsides of the memory trench MT are short-circuited. Furthermore, both endparts of the slit ST are elongated.

The configuration, manufacturing method, and effect of the embodimentother than the foregoing are similar to those of the tenth embodiment.

(Thirteenth Embodiment)

Next, a thirteenth embodiment is described.

The embodiment is a combination of the tenth embodiment and the fourthembodiment described above. That is, in the embodiment, the slit SS isformed before the slit ST. Furthermore, two control gate electrode films21 disposed on both sides of the memory trench MT are short-circuited.

FIG. 75 to FIG. 79 are plan views showing a method for manufacturing asemiconductor memory device according to the embodiment.

First, as shown in FIG. 75, both Y-direction end parts of the upper partof the multilayer body 25 are processed into a staircase pattern. Then,a plurality of memory trenches MT extending in the Y-direction areformed.

Next, as shown in FIG. 76, a slit SS is formed in the multilayer body25. The slit SS includes a frame portion and a plurality of rectangularportions. The frame portion partitions the multilayer body 25 intoblocks. The rectangular portions are disposed in the frame portion. Thelongitudinal direction of each rectangular portion is the X-direction.The longitudinal central part of the slit SS is caused to communicatewith one end part of the memory trench MT. Next, silicon oxide, forinstance, is embedded in the slit SS.

Next, as shown in FIG. 77, a slit ST extending in the Y-direction isformed in the region of the multilayer body 25 between the memorytrenches MT. The longitudinal end part of the slit ST is caused tocommunicate with the longitudinal end part of the slit SS. At this time,silicon oxide has already been embedded in the slit SS, and thepolysilicon film 52 does not exist. Thus, no control gate electrode film21 is formed.

Next, as shown in FIG. 78, a slit SSG is formed in the upper part of themultilayer body 25. The tooth part SSGt of the slit SSG is extended intoone end part of the memory trench MT, and into the slit SS disposed onthe other end part side of the memory trench MT.

Next, as shown in FIG. 79, both Y-direction end parts of the portion ofthe multilayer body 25 other than the upper part are processed into astaircase pattern. An upper select contact CS and a word line contact CWare formed. Thus, the semiconductor memory device 83 according to theembodiment is manufactured.

The configuration, manufacturing method, and effect of the embodimentother than the foregoing are similar to those of the tenth embodiment.

(Fourteenth Embodiment)

Next, a fourteenth embodiment is described.

The embodiment is a combination of the tenth embodiment and the fifthembodiment described above. That is, in the embodiment, the slit SS isformed before the slit ST. One end part of the slit ST is elongated.Furthermore, two control gate electrode films 21 disposed on both sidesof the memory trench MT are short-circuited.

FIG. 80 to FIG. 82 are plan views showing a method for manufacturing asemiconductor memory device according to the embodiment.

First, the process shown in FIG. 75 and FIG. 76 is performed.

Next, as shown in FIG. 80, a slit ST extending in the Y-direction isformed in the multilayer body 25. The longitudinal end part of the slitST is caused to communicate with the longitudinal end part of the slitSS. At this time, the slit ST is made longer than the memory trench MT.One end part of the slit ST is penetrated through the slit SS andextended out to the other side.

Next, as shown in FIG. 81, a slit SSG is formed in the upper part of themultilayer body 25. The tooth part SSGt of the slit SSG is extended intoone end part of the memory trench MT, and into the slit SS disposed onthe other end part side of the memory trench MT.

Next, as shown in FIG. 82, both Y-direction end parts of the portion ofthe multilayer body 25 other than the upper part are processed into astaircase pattern. An upper select contact CS and a word line contact CWare formed. Thus, the semiconductor memory device 84 according to theembodiment is manufactured.

The configuration, manufacturing method, and effect of the embodimentother than the foregoing are similar to those of the tenth embodiment.

(Fifteenth Embodiment)

Next, a fifteenth embodiment is described.

The embodiment is a combination of the tenth embodiment and the sixthembodiment described above. That is, in the embodiment, the slit SS isformed before the memory trench MT. Furthermore, two control gateelectrode films 21 disposed on both sides of the memory trench MT areshort-circuited.

FIG. 83 to FIG. 87 are plan views showing a method for manufacturing asemiconductor memory device according to the embodiment.

First, as shown in FIG. 83, both Y-direction end parts of the upper partof the multilayer body 25 are processed into a staircase pattern. Then,a slit SS is formed. The slit SS includes one frame portion and aplurality of rectangular portions staggered inside the frame portion.The longitudinal direction of each rectangular portion is theX-direction. In other words, the rectangular portions are arranged intwo rows spaced in the Y-direction. In each row, the rectangularportions are arranged along the X-direction. The arrangement of therectangular portions is shifted between the rows. Next, silicon oxide isembedded in the slit SS.

Next, as shown in FIG. 84, a plurality of memory trenches MT extendingin the Y-direction are formed in the multilayer body 25. At this time,one longitudinal end part of the memory trench MT is disposed near thelongitudinal (X-direction) central part of the slit SS, but not causedto communicate with the slit SS. The other end part of the memory trenchMT is disposed between the slits SS adjacent in the X-direction.

Next, as shown in FIG. 85, a slit ST extending in the Y-direction isformed in the region of the multilayer body 25 between the memorytrenches MT. The longitudinal end part of the slit ST is caused tocommunicate with the longitudinal end part of the slit SS. At this time,silicon oxide has already been embedded in the slit SS, and thepolysilicon film 52 does not exist. Thus, no control gate electrode film21 is formed.

Next, as shown in FIG. 86, a slit SSG is formed in the upper part of themultilayer body 25. The tooth part SSGt of the slit SSG is extended intoone end part of the memory trench MT, and into the slit SS disposed onthe other end part side of the memory trench MT.

Next, as shown in FIG. 87, both Y-direction end parts of the portion ofthe multilayer body 25 other than the upper part are processed into astaircase pattern. An upper select contact CS and a word line contact CWare formed. Thus, the semiconductor memory device 85 according to theembodiment is manufactured.

The configuration, manufacturing method, and effect of the embodimentother than the foregoing are similar to those of the tenth embodiment.

(Sixteenth Embodiment0

Next, a sixteenth embodiment is described.

The embodiment is a combination of the tenth embodiment and the seventhembodiment described above. That is, in the embodiment, the slit SS isformed before the memory trench MT. One end part of the slit ST iselongated. Furthermore, two control gate electrode films 21 disposed onboth sides of the memory trench MT are short-circuited.

FIG. 88 to FIG. 90 are plan views showing a method for manufacturing asemiconductor memory device according to the embodiment.

First, the process shown in FIG. 83 and FIG. 84 is performed.

Next, as shown in FIG. 88, a slit ST extending in the Y-direction isformed in the region of the multilayer body 25 between the memorytrenches MT. The longitudinal end part of the slit ST is caused tocommunicate with the longitudinal end part of the slit SS. However, oneend part of the slit ST is penetrated through the slit SS and extendedout to the other side. At this time, the polysilicon film 52 does notexist in the slit SS. Thus, no control gate electrode film 21 is formed.

Next, as shown in FIG. 89, a slit SSG is formed in the upper part of themultilayer body 25. The tooth part SSGt of the slit SSG is extended intoone end part of the memory trench MT, and into the slit SS disposed onthe other end part side of the memory trench MT.

Next, as shown in FIG. 90, both Y-direction end parts of the portion ofthe multilayer body 25 other than the upper part are processed into astaircase pattern. An upper select contact CS and a word line contact CWare formed. Thus, the semiconductor memory device 86 according to theembodiment is manufactured.

The configuration, manufacturing method, and effect of the embodimentother than the foregoing are similar to those of the tenth embodiment.

(Seventeenth Embodiment)

Next, a seventeenth embodiment is described.

In the embodiment, the slit ST is configured to double as a slit SS.Furthermore, two control gate electrode films 21 disposed on both sidesof the memory trench MT are short-circuited.

FIG. 91 to FIG. 94 are plan views showing a method for manufacturing asemiconductor memory device according to the embodiment.

First, as shown in FIG. 91, both Y-direction end parts of the upper partof the multilayer body 25 are processed into a staircase pattern. Then,a plurality of memory trenches MT extending in the Y-direction areformed in the multilayer body 25. The memory trenches MT are positionedat two levels in the Y-direction. The memory trenches MT are alternatelydisposed at the positions of these two levels. That is, with referenceto one memory trench MT, the Y-direction positions of the memorytrenches MT arranged at the odd-numbered places along the X-directionare equal to each other. The Y-direction positions of the memorytrenches MT arranged at the even-numbered places are equal to eachother, but different from the odd-numbered ones.

Next, as shown in FIG. 92, a slit ST is formed in the multilayer body25. The slit ST includes a frame portion and a meandering portion. Theframe portion partitions the multilayer body 25 into blocks. Themeandering portion extends in the X-direction while reciprocating in theY-direction inside the frame portion. The meandering portion is disposedso as to pass between the memory trenches MT. Both end parts of themeandering portion is caused to communicate with the frame portion.

Next, as shown in FIG. 93, a slit SSG is formed in the upper part of themultilayer body 25. The tooth part SSGt of the slit SSG is extended intoone end part of the memory trench MT, and into the portion of the slitST in contact with the other end part of the memory trench MT. Thus, thecontrol gate electrode films 21 sandwiching the memory trench MT areconnected to each other. The control gate electrode films 21 sandwichingthe slit ST are insulated from each other.

Next, as shown in FIG. 94, both Y-direction end parts of the portion ofthe multilayer body 25 other than the upper part are processed into astaircase pattern. An upper select contact CS and a word line contact CWare formed. Thus, the semiconductor memory device 87 according to theembodiment is manufactured. The configuration, manufacturing method, andeffect of the embodiment other than the foregoing are similar to thoseof the tenth embodiment.

In the example of the above embodiments, interlayer insulating films 24made of silicon oxide and polysilicon films 52 are alternately stackedto form a multilayer body 25. Then, the polysilicon films 52 are turnedto a floating gate electrode film 31 and a control gate electrode film21. However, the material forming the multilayer body 25 is not limitedthereto. For instance, silicon oxide films and silicon nitride films maybe alternately stacked to form a multilayer body. The silicon nitridefilms may be turned to a floating gate electrode film and a control gateelectrode film.

The embodiments described above can realize a semiconductor memorydevice and a method for manufacturing the same capable of easily formingpullout interconnects.

While certain embodiments have been described, these embodiments havebeen presented by way of example only, and are not intended to limit thescope of the inventions. Indeed, the novel embodiments described hereinmay be embodied in a variety of other forms; furthermore, variousomissions, substitutions and changes in the form of the embodimentsdescribed herein may be made without departing from the spirit of theinventions. The accompanying claims and their equivalents are intendedto cover such forms or modifications as would fall within the scope andspirit of the invention. Additionally, the embodiments described abovecan be combined mutually.

What is claimed is:
 1. A semiconductor memory device comprising: a substrate comprising a cell source line; a first bit line extending in a first direction, the first direction being parallel to an upper surface of the substrate; a first signal line extending in a second direction crossing the first direction and the upper surface of the substrate, the first signal line having a first portion contacting the cell source line at an end of the first signal line, a first select transistor being electrically connected to the first bit line and the first signal line; a second signal line being arranged apart from and adjacent to the first signal line in the first direction, the second signal line extending in the second direction, the second signal line having a second portion contacting the cell source line at an end of the second signal line in the second direction; a second select transistor being electrically connected to the first bit line and the second signal line; a first insulator disposed between the first signal line and the second signal line; a first gate electrode extending in a third direction crossing the first and the second directions; a second gate electrode extending in the third direction, the first signal line and the second signal line being disposed between the first gate electrode and the second gate electrode in the first direction; a first memory cell between the first signal line and the first gate electrode to store first information by applying voltage between the first signal line and the first gate electrode; a second memory cell between the second signal line and the second gate electrode to store second information by applying voltage between the second signal line and the second gate electrode; a third signal line being arranged apart from the second signal line in the first direction, the third signal line extending in the second direction, the third signal line having a third portion contacting the cell source line at an end of the third signal line in the second direction; a third select transistor being electrically connected to the first bit line and the third signal line; a fourth signal line being arranged apart from the third signal line in the first direction, the fourth signal line extending in the second direction, the fourth signal line having a fourth portion contacting the cell source line at an end of the fourth signal line in the second direction; a fourth select transistor being electrically connected to the first bit line and the fourth signal line; a second insulator disposed between the third signal line and fourth signal line; a third gate electrode extending in the third direction, the second gate electrode and the third gate electrode being disposed between the second signal line and the third signal line in the first direction; a fourth gate electrode extending in the third direction, the first gate electrode being electrically connected to one of the third gate electrode and the fourth gate electrode, and the second gate electrode being electrically connected to the other one of the third gate electrode and the fourth gate electrode; a third insulator disposed between the second gate electrode and the third gate electrode; a third memory cell between the third signal line and the third gate electrode to store third information by applying voltage between the third signal line and the third gate electrode; and a fourth memory cell between the fourth signal line and the fourth gate electrode to store fourth information by applying voltage between the fourth signal line and the fourth gate electrode, wherein the first portion and the second portion face each other in the first direction and contact each other beneath the first insulator and above the cell source line in the second direction, the first portion is dented in the first direction from an upper part of the first signal line and the second portion is dented in the first direction from an upper part of the second signal line.
 2. The semiconductor memory device according to claim 1, further comprising: a first contact electrically connected to the first select transistor; and a second contact electrically connected to the second select transistor.
 3. The semiconductor memory device according to claim 2, wherein the first contact and the second contact are next to each other in the first direction.
 4. The semiconductor memory device according to claim 2, further comprising: a fifth select transistor provided directly above the second select transistor in the second direction; and a third contact electrically connected to the fifth select transistor, the third contact being shorter than the second contact in the second direction.
 5. The semiconductor memory device according to claim 2, further comprising: a fourth contact electrically connected to the first gate electrode, the fourth contact being longer than both of the first and the second contact in the second direction.
 6. The semiconductor memory device according to claim 1, wherein a space between the second gate electrode and the third gate electrode is free from semiconductor.
 7. The semiconductor memory device according to claim 1, wherein the first gate electrode, the first memory cell, the first signal line, the first insulator, the second memory cell, the second signal line, the third insulator, the third gate electrode, the third memory cell, the third signal line, the second insulator, the fourth memory cell, and the fourth signal line exist along the first direction in this order.
 8. The semiconductor memory device according to claim 1, wherein the third portion and the fourth portion face each other in the first direction and contact each other beneath the second insulator and above the cell source line in the second direction, the third portion is dented in the first direction from an upper part of the third signal line, and the fourth portion is dented in the first direction from an upper part of the fourth signal line. 